The 2021 International Workshop on “Dielectric Thin Films for Future Electron Devices: Science and Technology” (IWDTF2021) will be held on-line, on November 14-16, 2021. The IWDTF started in 1999, based on a domestic annual workshop on ultrathin silicon dioxide films. The IWDTF2021 is the tenth workshop, which will focus on the science and technologies of dielectric films for electron devices, such as ultrathin dielectrics, high-k dielectrics, and ferroelectrics. In addition to the papers on materials and processes of dielectrics for conventional logic devices, the papers for various electron devices including the memory, the power, the analog, the sensor, and the display devices are welcomed. The IWDTF will provide a great opportunity for information exchange and discussions at forefront of the researches on future electron devices. The papers on both experimental and theoretical studies, for the deep understanding of the properties of dielectric films and their interfaces, are welcomed. The workshop will consist of invited and contributed talks. Selected topics of current interests will be reviewed by several invited talks.

Focus Session Topics

  • Progress of Ferroelectric HfO2 Technologies from Application Perspective
  • Progress of Selective ALD Growth and ALE Technologies

Papers are solicited in, but not limited to, the following area:

  • Electron device application of dielectric thin films
  • Material design of dielectric thin films
  • Growth and related process of dielectric thin films
  • Characterization and control of dielectrics, dielectrics surfaces, and dielectrics interfaces
  • Electrical characterization of dielectrics, dielectrics surfaces, and dielectrics interfaces
  • Surface preparation and cleaning issues for dielectrics
  • Dielectric wearout and reliability
  • Dielectric reliability related to process integration
  • Surface passivation technology
  • Theoretical approaches to dielectrics, dielectrics surfaces, and dielectrics interfaces